Light from germanium tin heterostructures on silicon

被引:4
|
作者
Kasper, E. [1 ]
Kittler, M.
Oehme, M. [1 ]
Arguirov, T.
机构
[1] Univ Stuttgart, Inst Semicond Engn, D-70174 Stuttgart, Germany
来源
关键词
Germanium tin; GeSn; light emitting diode; optical properties; infrared emission; silicon substrate; photonics; electroluminescence; ELECTROLUMINESCENCE; GE;
D O I
10.1117/12.2006594
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
GeSn LED's with Sn contents up to 4% exhibit light emission from the direct band transition although GeSn of low Sn contents is an indirect semiconductor.. The emission wavelength is red shifted compared to Ge. The redshift of the direct band transition is confirmed by different optical characterization techniques as photoluminescence, electroluminescence, photodetection and reflectivity. The photon emission energy decreases from 0.81 eV to 0.65 eV for compressively strained GeSn of 0% to 4% Sn content. Growth of GeSn up to 12% Sn is performed for which preliminary characterization results are given.
引用
收藏
页数:11
相关论文
共 50 条
  • [41] ELECTRON-CYCLOTRON-RESONANCE IN SILICON SILICON-GERMANIUM HETEROSTRUCTURES
    MURPHY, SQ
    SCHLESINGER, Z
    NELSON, SF
    CHU, JO
    MEYERSON, BS
    APPLIED PHYSICS LETTERS, 1993, 63 (02) : 222 - 224
  • [42] Epitaxial silicon and germanium on buried insulator heterostructures and devices
    Bojarczuk, NA
    Copel, M
    Guha, S
    Narayanan, V
    Preisler, EJ
    Ross, FM
    Shang, H
    APPLIED PHYSICS LETTERS, 2003, 83 (26) : 5443 - 5445
  • [43] Evaluation and control of interfaces in silicon-germanium heterostructures
    Baribeau, JM
    JOURNAL DE PHYSIQUE IV, 1997, 7 (C6): : 91 - 100
  • [44] Silicon-germanium interdiffusion in high-germanium-content epitaxial heterostructures
    Ozguven, Nevran
    McIntyre, Paul C.
    APPLIED PHYSICS LETTERS, 2008, 92 (18)
  • [45] Heterostructures of germanium nanowires and germanium-silicon oxide nanotubes and growth mechanisms
    Huang, J. Q.
    Chiam, S. Y.
    Chim, W. K.
    Wong, L. M.
    Wang, S. J.
    NANOTECHNOLOGY, 2009, 20 (42)
  • [46] Gating high mobility silicon-germanium heterostructures
    Griffin, N
    Paul, DJ
    Pepper, M
    Taylor, S
    Smith, JP
    Eccleston, W
    Fernandez, JM
    Joyce, BA
    MICROELECTRONIC ENGINEERING, 1997, 35 (1-4) : 309 - 312
  • [47] Chemical vapor deposition of silicon-germanium heterostructures
    Bozzo, S
    Lazzari, JL
    Coudreau, C
    Ronda, A
    d'Avitaya, FA
    Derrien, J
    Mesters, S
    Hollaender, B
    Gergaud, P
    Thomas, O
    JOURNAL OF CRYSTAL GROWTH, 2000, 216 (1-4) : 171 - 184
  • [48] Synthesis of silicon-germanium axial nanowire heterostructures in a solvent vapor growth system using indium and tin catalysts
    Mullane, E.
    Geaney, H.
    Ryan, K. M.
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2015, 17 (10) : 6919 - 6924
  • [49] Silicon-based silicon-germanium-tin heterostructure photonics
    Soref, Richard
    PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 2014, 372 (2012):
  • [50] High carrier lifetimes in epitaxial germanium-tin/Al(In)As heterostructures with variable tin compositions
    Hudait, Mantu K.
    Johnston, Steven W.
    Clavel, Michael B.
    Bhattacharya, Shuvodip
    Karthikeyan, Sengunthar
    Joshi, Rutwik
    JOURNAL OF MATERIALS CHEMISTRY C, 2022, 10 (29) : 10530 - 10540