Improved performance of co-sputtered Ni-Ti oxide films for all-solid-state electrochromic devices

被引：17
|
作者：
Dong, Dongmei [1 ]
Wang, Wenwen [1 ]
Dong, Guobo [1 ]
Zhang, Fan [1 ]
Yu, Hang [1 ]
He, Yingchun [1 ]
Diao, Xungang [1 ]
机构：
[1] Beihang Univ, Electrochrom Ctr, Beijing 100191, Peoples R China
来源：
RSC ADVANCES | 2016年 / 6卷 / 112期
基金：
北京市自然科学基金;
关键词：
THIN-FILMS; ELECTROCHEMICAL PERFORMANCE; GEL; COLORATION; INSERTION; LIFETIME; BEHAVIOR; INDIUM; LAYERS; ITO;
D O I：
10.1039/c6ra21961f
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Thin films of Ni-Ti oxide were co-sputtered by reactive direct current magnetron sputtering and their structures, morphologies, and compositions were investigated by X-ray diffraction, atomic force microscopy and X-ray photo-electron spectroscopy. Their electrochromic (EC) performances were studied using cyclic voltammetry, alternating current impedance and optical transmittance measurements. The proper addition of Ti helps the films achieve excellent EC behavior, including the stable coloration-bleaching cycles, high optical transmittance modulation (similar to 78%), great coloration efficiency (96 cm(2) C-1) and low alternating current impedance. Finally, the multiple-layer stacks ITO/ NiOx: Ti/PVB(Li+)/WO3/ITO were laminated based on the optimization of NiOx: Ti single layers. A large optical contrast (similar to 60%), a fast response time (3.2 and 4.4 s) and a good durability were obtained for the all-solid-state full EC device.
引用
收藏
页码：111148 / 111160
页数：13
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