New precursors for chemical and photochemical vapor deposition of copper metal.

被引：0
|
作者：
Maverick, AW [1 ]
Fan, H [1 ]
James, AM [1 ]
Bufaroosha, M [1 ]
Stewart, MP [1 ]
Cygan, ZT [1 ]
机构：
[1] LOUISIANA STATE UNIV,DEPT CHEM,BATON ROUGE,LA 70803
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1997年 / 214卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：66 / IEC
页数：2
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