New precursors for chemical and photochemical vapor deposition of copper metal.

被引：0
|
作者：
Maverick, AW [1 ]
Fan, H [1 ]
James, AM [1 ]
Bufaroosha, M [1 ]
Stewart, MP [1 ]
Cygan, ZT [1 ]
机构：
[1] LOUISIANA STATE UNIV,DEPT CHEM,BATON ROUGE,LA 70803
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1997年 / 214卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：66 / IEC
页数：2
相关论文
共 50 条
  • [1] Cu(hfac)2-amine adducts as precursors for chemical vapor deposition of copper metal.
    Cygan, ZT
    BuFaroosha, MS
    Fronczek, FR
    Maverick, AW
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1999, 217 : U1099 - U1099
  • [2] NEW ROUTES FOR CHEMICAL AND PHOTOCHEMICAL VAPOR-DEPOSITION OF COPPER METAL
    MAVERICK, AW
    JAMES, AM
    HUI, F
    ISOVITSCH, RA
    FRONCZEK, FR
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 465 - INOR
  • [3] COPPER(I) PRECURSORS FOR CHEMICAL VAPOR-DEPOSITION OF COPPER METAL
    KUMAR, R
    FRONCZEK, FR
    MAVERICK, AW
    LAI, WG
    GRIFFIN, GL
    CHEMISTRY OF MATERIALS, 1992, 4 (03) : 577 - 582
  • [4] PRECURSORS FOR CHEMICAL VAPOR-DEPOSITION OF COPPER
    KUMAR, R
    MAVERICK, AW
    FRONCZEK, FR
    LAI, G
    GRIFFIN, GL
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 201 : 256 - INOR
  • [5] Photochemical decomposition of Pt precursors for photoassisted chemical vapor deposition
    Liu, Hanwen
    Wheeler, Sarah
    Salazar, Bryan
    Walker, Amy
    McElwee-White, Lisa
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2019, 257
  • [6] Photochemical reactions of Ru precursors for photoassisted chemical vapor deposition
    Brewer, Christopher
    Hawkins, Olivia
    Salazar, Bryan
    Walker, Amy
    McElwee-White, Lisa
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2018, 255
  • [7] A THERMOANALYTICAL SURVEY OF PRECURSORS FOR COPPER METAL-ORGANIC CHEMICAL VAPOR-DEPOSITION
    GROSS, ME
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (08) : 2422 - 2426
  • [8] New precursors for chemical vapor deposition of iridium
    Xu, CY
    Baum, TH
    CHEMISTRY OF MATERIALS, 1998, 10 (09) : 2329 - +
  • [9] New liquid precursors for chemical vapor deposition
    Gordon, RG
    Chen, F
    Diceglie, NJ
    Kenigsberg, A
    Liu, X
    Teff, DJ
    Thornton, J
    CHEMICAL ASPECTS OF ELECTRONIC CERAMICS PROCESSING, 1998, 495 : 63 - 68
  • [10] Volatile Heteroligand Complexes of Copper(II): New Precursors for Chemical Vapor Deposition of Copper Films
    B. V. Krisyuk
    A. E. Turgambaeva
    P. A. Stabnikov
    I. K. Igumenov
    S. V. Sysoev
    Yu. M. Rumyantsev
    S. A. Prokhorova
    E. A. Maksimovskii
    O. V. Maslova
    Russian Journal of Applied Chemistry, 2018, 91 : 1068 - 1075
12345