Oxidation states of molybdenum in oxide films formed in sulphuric acid and sodium hydroxide

被引：26
|
作者：
Okonkwo, I. A. [1 ]
Doff, J. [1 ]
Baron-Wiechec, A. [1 ]
Jones, G. [2 ]
Koroleva, E. V. [1 ]
Skeldon, P. [1 ]
Thompson, G. E. [1 ]
机构：
[1] Univ Manchester, Ctr Corros & Protect, Sch Mat, Manchester M13 9PL, Lancs, England
[2] Waters Corp, Roundthorn Ind Est, Manchester M23 9LZ, Lancs, England
来源：
THIN SOLID FILMS | 2012年 / 520卷 / 19期
基金：
英国工程与自然科学研究理事会;
关键词：
Molybdenum; Oxides; Oxidation state; Sulphuric acid; Sodium hydroxide; X-ray photoelectron spectroscopy; Rutherford backscattering spectroscopy; Nuclear reaction analysis; RAY PHOTOELECTRON-SPECTROSCOPY; ANODIC-DISSOLUTION; ELECTRODE; BEHAVIOR; METAL; XPS;
D O I：
10.1016/j.tsf.2012.05.031
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
X-ray photoelectron spectroscopy is used to investigate the oxidation states of molybdenum in thin films formed potentiostatically, over a range of potentials, in either 1 mol dm(-3) H2SO4 or 10 mol dm(-3) NaOH at 20 degrees C. Mo 3d spectra suggested that MoO2 and Mo(OH)(2) were the main components of the films, with smaller amounts of MoO3 and possibly Mo2O5. O 1s spectra indicated the presence of oxygen as oxide and hydroxide species and as bound water. Ion beam analysis revealed the formation of thin films at all potentials, with significant losses of oxidized molybdenum to the electrolyte. (C) 2012 Elsevier B. V. All rights reserved.
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页码：6318 / 6327
页数：10
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