Investigation on the photocurrent tail of vanadium-compensated 4H-SiC for microwave application

被引:9
|
作者
Fu, Wentao [1 ]
Wang, Langning [1 ]
Wang, Bin [1 ]
Chu, Xu [1 ]
Xun, Tao [1 ]
Yang, Hanwu [1 ]
机构
[1] Natl Univ Def Technol, Adv Interdisciplinary Studies, Changsha 410073, Peoples R China
基金
中国国家自然科学基金;
关键词
HIGH-POWER;
D O I
10.1063/5.0111585
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Vanadium-compensated semi-insulating 4H-SiC photoconductive semiconductor switch (PCSS) has been a promising candidate for frequency-agile microwave generation. This application usually requires the PCSS to operate in linear mode so that a short carrier lifetime is required. However, in our experiment, some samples showed a long tail of photocurrent when illuminated with 532 nm light. To investigate the cause of the tail, we performed photocurrent tests at 532 and 1064 nm for two 4H-SiC samples with different doping. From the experimental results, we deduce that the cause is a hole trap that was not investigated previously. To verify it, we constructed a versatile transient simulation model of 4H-SiC triggered at sub-bandgap light. The model can deal with amphoteric V in steady state, the extrinsic light absorption and recombination process with more than one trap level. The simulation results agree well with the experiments. By characterizing the properties of the trap, we deduce that the unintentional doping of aluminum's shallow acceptor level functions as the hole trap. (c) 2022 Author(s).
引用
收藏
页数:8
相关论文
共 50 条
  • [31] Investigation of On and Off State Characteristics of 4H-SiC DMOSFETs
    Potbhare, Siddharth
    Goldsman, Neil
    Akturk, Akin
    Lelis, Aivars
    Green, Ronald
    SILICON CARBIDE AND RELATED MATERIALS 2008, 2009, 615-617 : 805 - 808
  • [32] Surface Recombination Investigation in Thin 4H-SiC Layers
    Gulbinas, Karolis
    Grivickas, Vytautas
    Mahabadi, Haniyeh P.
    Usman, Muhammad
    Hallen, Anders
    MATERIALS SCIENCE-MEDZIAGOTYRA, 2011, 17 (02): : 119 - 124
  • [33] Physical simulations on the operation of 4H-SiC microwave power transistors
    Jonsson, R
    Wahab, Q
    Rudner, S
    SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 : 1263 - 1266
  • [34] Investigation magnetism state of undoped surface of 4H-SiC
    Yu, Lin
    Liu, Donghong
    Dai, Ying
    Huang, Baibiao
    INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2, 2010, : 880 - +
  • [35] Raman investigation of aluminum-doped 4H-SiC
    Juillaguet, S.
    Kwasnicki, P.
    Peyre, H.
    Konczewicz, L.
    Contreras, S.
    Zielinski, M.
    Camassel, J.
    SILICON CARBIDE AND RELATED MATERIALS 2012, 2013, 740-742 : 357 - +
  • [36] Experimental investigation of 4H-SiC bulk crystal growth
    Cent Natl de la Recherche, Scientifique, St Martin D'Heres, France
    Materials Science Forum, 1998, 264-268 (pt 1): : 17 - 20
  • [37] Vanadium-free semi-insulating 4H-SiC substrates
    Mitchel, WC
    Saxler, A
    Perrin, R
    Goldstein, J
    Smith, SR
    Evwaraye, AO
    Solomon, JS
    Brady, M
    Tsvetkov, V
    Carter, CH
    SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 : 21 - 24
  • [38] Vanadium doping in 4H-SiC epitaxial growth for carrier lifetime control
    Miyazawa, Tetsuya
    Tawara, Takeshi
    Takanashi, Ryosuke
    Tsuchida, Hidekazu
    APPLIED PHYSICS EXPRESS, 2016, 9 (11)
  • [39] Vanadium doping in 4H-SiC epitaxial growth for carrier lifetime control
    Central Research Institute of Electric Power Industry , Yokosuka
    Kanagawa
    240-0196, Japan
    不详
    Ibaraki
    305-8569, Japan
    不详
    Tokyo
    191-8502, Japan
    Appl. Phys. Express, 1882, 11
  • [40] Investigation of drain current saturation in 4H-SiC MOSFETs
    Pennington, G.
    Potbhare, S.
    Goldsman, N.
    Habersat, D.
    Lelis, A.
    McGarrity, J.
    Ashman, C.
    SILICON CARBIDE AND RELATED MATERIALS 2006, 2007, 556-557 : 811 - +