Comparison of Shack-Hartmann sensor and Point Diffraction Interferometer for Wavefront Aberration analysis

被引：0
|
作者：
Marzoa, A. [1 ]
Bosch, S. [1 ]
Vallmitjana, S. [1 ]
机构：
[1] Univ Barcelona, Fac Phys, Dept Appl Phys, Barcelona, Spain
来源：
2016 15TH WORKSHOP ON INFORMATION OPTICS (WIO) | 2016年
关键词：
wavefront; aberration; optical testing; Zernike polynomials; Shack-Hartmann; Point diffraction interferometer;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Two methods for assessing the image quality of optical systems based on the analysis of wavefront aberration (WA) are presented together. The methods and the experimental setups are broadly described. A comparative study between those two techniques on the analysis of a meniscus lens has been carried out and an equivalence between both techniques has been tested and demonstrated, by comparing the RMS associated to their measured Zernike coefficients.
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页数：3
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