Switching in Nanoscale Hafnium Oxide-Based Ferroelectric Transistors

被引:1
|
作者
Mulaosmanovic, Halid [1 ]
Schroeder, Uwe [1 ]
Mikolajick, Thomas [1 ,2 ]
Slesazeck, Stefan [1 ]
机构
[1] Nanoelect Mat Lab NaMLab gGmbH, Noethnitzer Str 64a, D-01187 Dresden, Germany
[2] Tech Univ Dresden, IHM, Noethnitzer Str 64, D-01187 Dresden, Germany
关键词
DOMAIN-STRUCTURE;
D O I
10.1007/978-981-15-1212-4_5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The recent advent of ferroelectricity in thin hafnium oxide films has enabled an unprecedented scaling of ferroelectric field-effect transistors (FeFETs) based on this material. However, the small-area devices, which have the channel length of only a few tens of nanometers, show some striking performance differences when compared to the large-area ones. In this chapter, the switching of these nanoscale FeFETs will be investigated. In particular, novel switching phenomena will be pointed out, including the abrupt and stepwise switching transitions, the appearance of switching stochasticity and the evidence for the accumulative switching upon identical voltage excitations. These properties not only provide new and useful insights for memory applications but also set the basis for exploiting FeFETs for novel applications, such as neuromorphic and stochastic computing.
引用
收藏
页码:97 / 108
页数:12
相关论文
共 50 条
  • [21] Intrinsic variations of ultrathin hafnium oxide-based ferroelectric tunnel junctions induced by ferroelectric-dielectric phase fluctuations
    Chang, Pengying
    Fan, Mengqi
    Du, Gang
    Liu, Xiaoyan
    Xie, Yiyang
    [J]. SCIENCE CHINA-INFORMATION SCIENCES, 2023, 66 (10)
  • [22] The Role of Ti Buffer Layer Thickness on the Resistive Switching Properties of Hafnium Oxide-Based Resistive Switching Memories
    Raharnan, Sk. Ziaur
    Lin, Yu-De
    Lee, Heng-Yuan
    Chen, Yu-Sheng
    Chen, Pang-Shiu
    Chen, Wei-Su
    Hsu, Chien-Hua
    Tsai, Kan-Hsueh
    Tsai, Ming-Jinn
    Wang, Pei-Hua
    [J]. LANGMUIR, 2017, 33 (19) : 4654 - 4665
  • [23] A nanoscale study of hafnium oxide resistive memory switching dynamics
    Blonkowski, S.
    Benyoussef, M.
    Kogelschatz, M.
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2024, 57 (21)
  • [24] Intrinsic variations of ultrathin hafnium oxide-based ferroelectric tunnel junctions induced by ferroelectric-dielectric phase fluctuations
    Pengying CHANG
    Mengqi FAN
    Gang DU
    Xiaoyan LIU
    Yiyang XIE
    [J]. Science China(Information Sciences), 2023, 66 (10) : 329 - 330
  • [25] Time Response of Polarization Switching in Ge Hafnium Zirconium Oxide Nanowire Ferroelectric Field-effect Transistors
    Alghamdi, Sami
    Chung, Wonil
    Si, Mengwei
    Ye, Peide D.
    [J]. 2018 76TH DEVICE RESEARCH CONFERENCE (DRC), 2018,
  • [26] Dynamics Studies of Polarization Switching in Ferroelectric Hafnium Zirconium Oxide
    Lyu, X.
    Si, M.
    Shrestha, P. R.
    Cheung, K. P.
    Ye, P. D.
    [J]. 2021 5TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE (EDTM), 2021,
  • [27] Role of oxygen vacancies in ferroelectric or resistive switching hafnium oxide
    Jaewook Lee
    Kun Yang
    Ju Young Kwon
    Ji Eun Kim
    Dong In Han
    Dong Hyun Lee
    Jung Ho Yoon
    Min Hyuk Park
    [J]. Nano Convergence, 10
  • [28] Role of oxygen vacancies in ferroelectric or resistive switching hafnium oxide
    Lee, Jaewook
    Yang, Kun
    Kwon, Ju Young
    Kim, Ji Eun
    Han, Dong In
    Lee, Dong Hyun
    Yoon, Jung Ho
    Park, Min Hyuk
    [J]. NANO CONVERGENCE, 2023, 10 (01)
  • [29] Enhanced resistive switching performance of hafnium oxide-based devices: Effects of growth and annealing temperatures
    Swathi, S. P.
    Angappane, S.
    [J]. JOURNAL OF ALLOYS AND COMPOUNDS, 2022, 913
  • [30] Ferroelectricity in Hafnium Oxide: CMOS compatible Ferroelectric Field Effect Transistors
    Boescke, T. S.
    Mueller, J.
    Braeuhaus, D.
    Schroeder, U.
    Boettger, U.
    [J]. 2011 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM), 2011,