Optical characterization of Srm-3Bi4TimO3m+3 (m=4, 5, 6) thin films grown by pulsed laser deposition method

被引：20
|
作者：
Tachiki, M
Yamamuro, K
Kobayashi, T
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1996年 / 35卷 / 6A期
关键词：
ferroelectrics; bismuth layered-structure oxide; Srm-3Bi4TimO3m+3; PLD method; thin film; epitaxial growth; optical properties; transmission spectra; FTIR;
D O I：
10.1143/JJAP.35.L719
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Srm-3Bi4TimO3m+3 (m = 4, 5, 6) thin films were grown on (100)MgO and (100)Pt/(100)MgO substrates by the pulsed laser deposition (PLD) method. X-ray diffraction (XRD) revealed c-axis-oriented crystal growth of each Srm-3Bi4TimO3m+3 film. Reflection high-energy electron diffraction (RHEED) from the films showed a streak pattern which indicates the epitaxial ordering of the fabricated thin films. Fundamental optical absorption of SrBi4Ti4O15, Sr2Bi4Ti5O18 and Sr3Bi4Ti6O21 films started at 3.4, 3.5 and 3.7 eV, respectively. Moreover, the Fourier transform infrared (FTIR) spectra also revealed a systematic change in their LO-phonon absorption dip structure.
引用
收藏
页码：L719 / L721
页数：3
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