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Vertical β-Ga2O3 Power Transistors: A Review
被引:118
|作者:
Wong, Man Hoi
[1
,2
]
Higashiwaki, Masataka
[1
]
机构:
[1] Natl Inst Informat & Commun Technol, Tokyo 1848795, Japan
[2] Univ Massachusetts Lowell, Dept Elect & Comp Engn, Lowell, MA 01854 USA
关键词:
Breakdown;
current aperture;
current blocking layer (CBL);
depletion mode (D-mode);
drain-induced barrier lowering (DIBL);
enhancement mode (E-mode);
FinFET;
Ga2O3;
gallium oxide;
halide vapor phase epitaxy (HVPE);
interface trap;
ion implantation;
power transistor;
vertical metal-oxide-semiconductor field-effect transistor (MOSFET);
wide bandgap;
SI-DOPED BETA-GA2O3;
SINGLE-CRYSTALS;
GA2O3;
MOSFETS;
GROWTH;
LAYERS;
FIGURE;
ABSORPTION;
MERIT;
MOVPE;
EDGE;
D O I:
10.1109/TED.2020.3016609
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
With projected performance advantages over silicon and incumbent wide-bandgap compound semiconductors, gallium oxide (Ga2O3) has garnered worldwide attention as an ultrawide-bandgap semiconductor material suitable for high-voltage, high-temperature, and radiation-hard electronics. Thanks to recent breakthroughs in crystal growth and device processing technologies, the research and development of vertically oriented Ga2O3 power transistors has made rapid strides. In this article, we review the important engineering achievements and performance milestones of the two major types of vertical Ga2O3 transistors-current aperture vertical metal-oxide-semiconductor field-effect transistors (MOSFETs) and vertical fin-channel MOSFETs. Challenges underlying the unique processing approaches to these devices and their implications on device reliability are also discussed.
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页码:3925 / 3937
页数:13
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