Influence Of Si Layer Thickness On The Structure And Magnetic Properties Of Si/Fe Multilayers

被引：1
|
作者：
Das, S. S. [1 ]
Kumar, M. Senthil [1 ]
机构：
[1] Indian Inst Technol, Dept Phys, Bombay 400076, Maharashtra, India
来源：
PROCEEDING OF INTERNATIONAL CONFERENCE ON RECENT TRENDS IN APPLIED PHYSICS & MATERIAL SCIENCE (RAM 2013) | 2013年 / 1536卷
关键词：
Magnetic multilayers; Semiconducting spacer; X-ray diffraction; Magnetization;
D O I：
10.1063/1.4810547
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A series of Si/Fe multilayers were prepared by dc-magnetron sputtering at ambient temperature. Structural and magnetic properties were investigated as a function of Si layer thickness. X-ray diffraction and high resolution transmission electron diffraction data show that the Fe layers are nanocrystalline whereas the Si layers are amorphous. The position of the Fe (110) peak was found to be shifted towards the higher 2 theta side of the bulk value due to intrinsic compressive stress on the Fe layers induced by adjacent Si layers. The in-plane magnetization measurements show soft ferromagnetic behavior with strong in-plane magnetic anisotropy. Saturation magnetization remains almost constant for t(Si) >= 30 angstrom and shows a slight increase towards bulk value of Fe for t(Fe) < 30 angstrom.
引用
收藏
页码：955 / 956
页数：2
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