Friction force microscopy study of annealed diamond-like carbon film

被引：7

作者：

Choi, Won Seok ^{[2
]}

Joung, Yeun-Ho ^{[2
]}

Heo, Jinhee ^{[3
]}

Hong, Byungyou ^{[1
]}

机构：

[1] Sungkyunkwan Univ, Sch Informat & Commun Engn, Suwon 440746, South Korea

[2] Hanbat Natl Univ, Sch Elect Engn, Taejon 305719, South Korea

[3] Korea Inst Mat Sci, Mat Safety Evaluat Grp, Chang Won 641831, South Korea

来源：

MATERIALS RESEARCH BULLETIN | 2012年 / 47卷 / 10期

关键词：

Amorphous materials; Plasma deposition; Atomic force microscopy; Microstructure; Surface properties; THERMAL-STABILITY; ROUTE;

D O I：

10.1016/j.materresbull.2012.04.141

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this paper we introduce mechanical and structural characteristics of diamond-like carbon (DLC) films which were prepared on silicon substrates by radio frequency (RF) plasma enhanced chemical vapor deposition (PECVD) method using methane (CH4) and hydrogen (H-2) gas. The films were annealed at various temperatures ranging from 300 to 900 degrees C in steps of 200 degrees C using rapid thermal processor (RIP) in nitrogen ambient. Tribological properties of the DLC films were investigated by atomic force microscopy (AFM) in friction force microscopy (FFM) mode. The structural properties of the films were obtained by high resolution transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The wettability of the films was obtained using contact angle measurement. XPS analysis showed that the sp(3) content is decreased from 75.2% to 24.1% while the sp(2) content is increased from 24.8% to 75.9% when the temperature is changed from 300 to 900 degrees C. The contact angles of DLC films were higher than 70 degrees. The FFM measurement results show that the highest friction coefficient value was achieved at 900 degrees C annealing temperature. (C) 2012 Elsevier Ltd. All rights reserved.

引用

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页码：2780 / 2783

页数：4

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