Molecular Dynamics Simulation of Amorphous SiO2 Fracture

被引:0
|
作者
Knoll, Aaron [1 ]
Insley, Joe [1 ]
Papka, Michael E. [1 ]
Nomura, Ken-ichi
Kalia, Rajiv K.
Nakano, Aiichiro
Vashishta, Priya
机构
[1] Argonne Natl Lab, Lemont, IL USA
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D O I
暂无
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
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页码:1569 / +
页数:2
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