Step Edges in Thin Films of Lamellar-Forming Diblock Copolymer

被引:20
|
作者
Stasiak, P. [1 ]
McGraw, J. D. [2 ,3 ]
Dalnoki-Veress, K. [2 ,3 ]
Matsen, M. W. [1 ]
机构
[1] Univ Reading, Sch Math & Phys Sci, Reading RG6 6AX, Berks, England
[2] McMaster Univ, Dept Phys & Astron, Hamilton, ON L8S 4M1, Canada
[3] McMaster Univ, Brockhouse Inst Mat Res, Hamilton, ON, Canada
基金
英国工程与自然科学研究理事会; 加拿大自然科学与工程研究理事会;
关键词
CONSISTENT-FIELD THEORY; PARALLEL ALGORITHM; SURFACE-TENSION; STABILITY; DROPLETS; DYNAMICS; DOMAINS; MELTS;
D O I
10.1021/ma302143q
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Self-consistent field theory (SCFT) is used to study the step edges that occur in thin films of lamellar-forming diblock copolymer, when the surfaces each have an affinity for one of the polymer components. We examine film morphologies consisting of a stack of nu continuous monolayers and one semi-infinite bilayer, the edge of which creates the step. The line tension of each step morphology is evaluated and phase diagrams are constructed showing the conditions under which the various morphologies are stable. The predicted behavior is then compared to experiment. Interestingly, our atomic force microscopy (AFM) images of terraced films reveal a distinct change in the character of the steps with increasing nu, which is qualitatively consistent with our SCFT phase diagrams. Direct quantitative comparisons are not possible because the SCFT is not yet able to probe the large polymer/air surface tensions characteristic of experiment.
引用
收藏
页码:9531 / 9538
页数:8
相关论文
共 50 条
  • [21] Stringlike structure formed in thin films of a lamella-forming diblock copolymer
    Fukunaga, K
    Hashimoto, T
    PHYSICAL REVIEW E, 2004, 69 (04): : 4
  • [22] THERMODYNAMICS OF THIN, DIBLOCK COPOLYMER FILMS
    WONG, KY
    TRACHE, M
    MCMULLEN, WE
    JOURNAL OF CHEMICAL PHYSICS, 1994, 101 (06): : 5372 - 5387
  • [23] ORDERING OF THIN DIBLOCK COPOLYMER FILMS
    MENELLE, A
    RUSSELL, TP
    ANASTASIADIS, SH
    SATIJA, SK
    MAJKRZAK, CF
    PHYSICAL REVIEW LETTERS, 1992, 68 (01) : 67 - 70
  • [24] Morphology of thin films of lamellar diblock copolymers
    Kim, YS
    Suh, KY
    Lee, HH
    PHYSICAL REVIEW E, 1997, 56 (04): : 4887 - 4889
  • [25] Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography
    Borah, Dipu
    Cummins, Cian
    Rasappa, Sozaraj
    Senthamaraikannan, Ramsankar
    Salaun, Mathieu
    Zelsmann, Marc
    Liontos, George
    Ntetsikas, Konstantinos
    Avgeropoulos, Apostolos
    Morris, Michael A.
    NANOMATERIALS, 2018, 8 (01):
  • [27] Morphological transition in thin lamellar diblock copolymer films as revealed by combined GISAXS and AFM studies
    Papadakis, CM
    Busch, P
    Posselt, D
    Smilgies, DM
    ADVANCES IN SOLID STATE PHYSICS 44, 2004, 44 : 327 - 338
  • [28] The effect of osmium staining on lamellar spacing in thin polystyrene-polyisoprene diblock copolymer films
    Staniewicz, Lech
    Donald, Athene M.
    Stokes, Debbie J.
    ELECTRON MICROSCOPY AND ANALYSIS GROUP CONFERENCE 2009 (EMAG 2009), 2010, 241
  • [29] Electric-field-induced lamellar to hexagonally perforated lamellar transition in diblock copolymer thin films: kinetic pathways
    Mukherjee, Arnab
    Ankit, Kumar
    Reiter, Andreas
    Selzer, Michael
    Nestler, Britta
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2016, 18 (36) : 25609 - 25620
  • [30] Density mismatch in thin diblock copolymer films
    Martins, S
    Morgado, WAM
    Massunaga, MSO
    Bahiana, M
    PHYSICAL REVIEW E, 2000, 61 (04): : 4118 - 4124