Effect of the boron content on the steam activation of boron-doped diamond electrodes

被引:22
|
作者
Zhang, Junfeng [1 ]
Nakai, Takaaki [2 ]
Uno, Masaharu [2 ]
Nishiki, Yoshinori [2 ]
Sugimoto, Wataru [1 ]
机构
[1] Shinshu Univ, Fac Text Sci & Technol, Ueda, Nagano 3868567, Japan
[2] Permelec Electrode Ltd, Fujisawa, Kanagawa 2520816, Japan
关键词
NANOCRYSTALLINE DIAMOND; CHEMICAL SURFACE; XPS SPECTRA; CVD DIAMOND; RAMAN; OXIDATION; FILMS; LAYERS;
D O I
10.1016/j.carbon.2013.08.015
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In order to investigate the initial stages of the steam-activation process of boron-doped diamond (BDD) electrodes, polycrystalline BDD electrodes with different levels of boron doping (800, 2500 and 5000 ppm) and crystal orientation were treated with water vapor at 800 degrees C. A higher degree of etching was observed for BDD electrodes with higher boron content. Based on scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy, it is suggested that the {111} planes are preferentially etched. Thus, high-boron containing BDD electrodes which have a higher abundance of the {111} planes are heavily etched, while low-boron containing BDD electrodes with a mixed surface of {100} and {111} planes are less corroded. The steam activation of BDD electrodes have a higher electrochemically active surface area and wider potential window compared to pristine BDD electrodes. (C) 2013 Elsevier Ltd. All rights reserved.
引用
收藏
页码:206 / 213
页数:8
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