Effects of parallel magnetic field on electrocodeposition behavior of Fe/nano-Si particles composite electroplating

被引:23
|
作者
Zhou, Pengwei [1 ]
Zhong, Yunbo [1 ]
Wang, Huai [1 ]
Long, Qiong [1 ]
Li, Fu [1 ]
Sun, Zongqian [1 ]
Dong, Licheng [1 ]
Fan, Lijun [1 ]
机构
[1] Shanghai Univ, Shanghai Key Lab Modern Met & Mat Proc, Shanghai 200072, Peoples R China
关键词
Parallel magnetic field; Iron; Electrocodeposition; MHD; Magnetic gradient force; SHEET; CODEPOSITION; FILMS;
D O I
10.1016/j.apsusc.2013.06.022
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The influence of an external parallel strong parallel magnetic field (respect to current) on the electrocodeposition of nano-silicon particles into an iron matrix has been studied in this paper. Test results show that magnetic field has a great influence on the distribution of silicon, as well as the surface morphology and the thickness of the composite coatings. When no magnetic field was applied, a high current density was needed to get high concentration of silicon particles, while that could be easily obtained at a low current density with a 2 T parallel magnetic field. However, Owing to the unevenness of the current density J-distribution on the surface of the electrode in 8 T, the thicker and rougher composite deposits appear in the edge region (L or R region), and the thinner and smoother ones appear in the middle region (M). Meanwhile, the distribution curve of silicon content looks like a "pan" along the center line of coatings. A possible mechanism combining to the numerical simulation results was suggested out to illustrate the obtained experiment results. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:624 / 631
页数:8
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