Ultrathin Semiconductor Superabsorbers from the Visible to the Near-Infrared

被引:27
|
作者
Molet, Pau [1 ]
Luis Garcia-Pomar, Juan [1 ]
Matricardi, Cristiano [1 ]
Garriga, Miquel [1 ]
Isabel Alonso, Maria [1 ]
Mihi, Agustin [1 ]
机构
[1] CSIC, Inst Ciencia Mat Barcelona ICMAB, Campus UAB, Bellaterra 08193, Catalonia, Spain
基金
欧洲研究理事会;
关键词
broadband absorption; nanostructuring; photonic crystal; soft lithography; SOLAR-CELLS; FILM; ABSORPTION;
D O I
10.1002/adma.201705876
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The design of ultrathin semiconducting materials that achieve broadband absorption is a long-sought-after goal of crucial importance for optoelectronic applications. To date, attempts to tackle this problem consisted either of the use of strongbut narrowbandor broaderbut moderatelight-trapping mechanisms. Here, a strategy that achieves broadband optimal absorption in arbitrarily thin semiconductor materials for all energies above their bandgap is presented. This stems from the strong interplay between Brewster modes, sustained by judiciously nanostructured thin semiconductors on metal films, and photonic crystal modes. Broadband near-unity absorption in Ge ultrathin films is demonstrated, which extends from the visible to the Ge bandgap in the near-infrared and is robust against angle of incidence variation. The strategy follows an easy and scalable fabrication route enabled by soft nanoimprinting lithography, a technique that allows seamless integration in many optoelectronic fabrication procedures.
引用
收藏
页数:6
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