Theory of the nucleation, growth, and structure of hydrogen-induced extended defects in silicon

被引:62
|
作者
Reboredo, FA [1 ]
Ferconi, M
Pantelides, ST
机构
[1] Vanderbilt Univ, Dept Phys & Astron, Nashville, TN 37235 USA
[2] Oak Ridge Natl Lab, Div Solid State, Oak Ridge, TN 37831 USA
关键词
D O I
10.1103/PhysRevLett.82.4870
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Implantation and plasma indiffusion of H in crystalline Si are known to induce planar defects (platelets) whose structure has remained elusive. We report extensive first-principles calculations that reveal mechanisms for the nucleation and,growth of aggregates of second-neighbor hydrogenated vacancies. These defects exhibit the key features associated with platelets, including a preference for (111) and (100) planes, H release, and trapping of H-2 molecules. [S0031-9007(99)09314-X].
引用
收藏
页码:4870 / 4873
页数:4
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