Characterisation of Glasgow/CNM double-sided 3D sensors

被引:0
|
作者
Mac Raighne, Aaron [1 ]
Akiba, K. [7 ]
Balbuena, J. P.
Bates, R. [2 ]
van Beuzekom, M. [7 ]
Buytaert, J. [4 ]
Collins, P. [4 ]
Crossley, M. [4 ]
Dumps, R. [4 ]
Eklund, L. [2 ]
Fleta, C.
Gallas, A. [5 ]
Gersabeck, M. [2 ]
Gligorov, V. V. [2 ]
John, M. [6 ]
Koehler, M. [3 ]
Lozano, M.
Maneuski, D. [2 ]
Parzefall, U. [3 ]
Quirion, D.
Plackett, R. [4 ]
Parkes, C. [2 ]
Pellegrini, G. [2 ]
Rodrigues, E. [2 ]
Stewart, G.
机构
[1] Dublin Inst Technol, Sch Phys, Kevin St, Dublin 8, Ireland
[2] Univ Glasgow, SUPA, Sch Phys & Astron, Glasgow, Lanark, Scotland
[3] Univ Freiberg, Inst Phys, Freiberg, Germany
[4] CERN, CH-1211 Geneva, Switzerland
[5] Univ Santiago, Fac Phys, Santiago De Compostela, Spain
[6] Univ Oxford, Dept Phys, Oxford, England
[7] Natl Inst Subatom Phys, Amsterdam, Netherlands
基金
英国工程与自然科学研究理事会;
关键词
3D sensors; high energy physics detectors; radiation-hardness; silicon detectors; PIXEL READOUT CHIP; 3-D DETECTORS; MEDIPIX2; UPGRADE;
D O I
10.1016/j.phpro.2012.02.445
中图分类号
O59 [应用物理学];
学科分类号
摘要
3D detectors are proposed as an alternative to planar silicon technology to withstand the high radiation environments in planned future high energy physics experiments. Here we review the characterization of double-sided 3D detectors designed and built at CNM and the University of Glasgow. A non-irradiated sensor is characterized in a pion test-beamutilizing the Timepix telescope. The charge collection and detection efficiency across the unit pixel are shown. Area of inefficiency can be found at the columnar electrodes at perpendicular angles of beam incidence while the pixels are shown to be fully efficient at angles greater than ten degrees. A reduction in charge sharing compared to the planar technology is also demonstrated. Charge collection studies on irradiated devices with a Sr-90 source show higher charge collection efficiency for 3D over planar sensors at significantly lower applied bias. The sub-pixel response is probed by a micro-focused laser beam demonstrating areas of charge multiplication at high bias voltages. (C) 2012 Published by Elsevier B. V. Selection and/or peer review under responsibility of the organizing committee for TIPP 11.
引用
收藏
页码:1016 / 1023
页数:8
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