Localized Breakdown of the Natural Oxide Film on Aluminum by Chloride Ions and the Formation of Oxide Blisters

被引:3
|
作者
McCafferty, E. [1 ]
Natishan, P. M. [1 ]
机构
[1] Sci Applicat Int Corp, Mclean, VA 22102 USA
来源
PITS AND PORES 4: NEW MATERIALS AND APPLICATIONS - IN MEMORY OF ULRICH GOSELE | 2011年 / 33卷 / 16期
关键词
PITTING CORROSION; STAINLESS-STEEL; PASSIVITY; INITIATION; ALLOYS; MECHANISM; KINETICS; RUPTURE; ANIONS; PH;
D O I
10.1149/1.3553155
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
A sequence of events is discussed for the initiation and propagation of corrosion pits on aluminum in chloride solutions. Corrosion pit initiation takes into account adsorption of chloride ions on the oxide surface, penetration of chloride ions through the oxide film, and localized dissolution of aluminum at the metal/oxide interface. Corrosion pit propagation involves formation of blisters beneath the oxide film due to localized reactions which produce an acidic localized environment. The blisters subsequently rupture due to the formation of hydrogen gas in the occluded corrosion cell. Calculation of the local pH within a blister from the computed hydrogen pressure within the blister gives pH values in the range 0.85 to 2.3.
引用
收藏
页码:47 / 56
页数:10
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