Hydrogen etching effects during plasma doping processes and impact on shallow junction formation

被引：0
|
作者：
Qin, S [1 ]
Bernstein, JD [1 ]
Chan, C [1 ]
机构：
[1] NORTHEASTERN UNIV,DEPT ELECT & COMP ENGN,PLASMA SCI & MICROELECTR RES LAB,BOSTON,MA 02115
来源：
ION-SOLID INTERACTIONS FOR MATERIALS MODIFICATION AND PROCESSING | 1996年 / 396卷
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D O I：
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中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：509 / 514
页数：6
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