CN(B 2Σ+) formation and emission in a N2-CH4 atmospheric pressure dielectric barrier discharge

被引:31
|
作者
Dilecce, G. [1 ,2 ]
Ambrico, P. F. [1 ]
Scarduelli, G. [3 ]
Tosi, P. [3 ]
De Benedictis, S. [1 ]
机构
[1] CNR, Ist Metodol Inorgan Plasmi, I-70126 Bari, Italy
[2] CNR, Ist Foton & Nanotecnol, I-38050 Trento, Italy
[3] Univ Trent, Dipartimento Fis, I-38050 Trento, Italy
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2009年 / 18卷 / 01期
关键词
FLOWING AFTERGLOW; ACTIVE NITROGEN; RATE CONSTANTS; KINETICS; SPECTROSCOPY; N-2; DENSITY; PLASMA;
D O I
10.1088/0963-0252/18/1/015010
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
We have investigated CN(B (2)Sigma(+) -> X (2)Sigma(+)) violet system emission and laser induced fluorescence in an atmospheric pressure pulsed dielectric barrier discharge and found a high degree of vibrational non-equilibrium in both CN(B, v) and CN(X, v'). The vibrational distributions depend strongly on the gas feed composition and on the discharge/post-discharge regime. Analysis of the time resolved laser and emission spectroscopy measurements leads to the conclusion that two main chemi-luminescent mechanisms are active in the CN( B) excitation. One is the C + N + M -> CN(A, B) + M recombination, that is dominant in the post-discharge; the other one, active in the discharge, is probably the reaction N + CH -> CN(A, B) + H. Both reactions give intense emission when the discharge is operated in a pure N-2 gas feed in the presence of the surface deposit produced by a N-2-CH4 mixture discharge. C and CH must then be produced starting from some intermediate species coming from the surface. When CH4 is added to the gas feed, the recombination reaction is strongly inhibited, while CH can be produced more easily from the methane contained in the gas phase. It is also likely that CN(X) is produced by the same reactions after radiative cascade from CN(A, B) states.
引用
收藏
页数:16
相关论文
共 50 条
  • [41] A new approach to SiO2 deposit using a N2-SiH4-N2O glow dielectric barrier-controlled discharge at atmospheric pressure
    Gherardi, N
    Martin, S
    Massines, F
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2000, 33 (19) : L104 - L108
  • [42] Chemical reaction studies in CH4/Ar and CH4/N2 gas mixtures of a dielectric barrier discharge
    Majumdar, A
    Behnke, JF
    Hippler, R
    Matyash, K
    Schneider, R
    [J]. JOURNAL OF PHYSICAL CHEMISTRY A, 2005, 109 (41): : 9371 - 9377
  • [43] Positive ion chemistry in an N2-CH4 plasma discharge: Key precursors to the growth of Titan tholins
    Dubois, David
    Carrasco, Nathalie
    Jovanovic, Lora
    Vettier, Ludovic
    Gautier, Thomas
    Westlake, Joseph
    [J]. ICARUS, 2020, 338
  • [44] Simulation study of the removal of NO from N2/NO mixture by pulsed dielectric-barrier discharge at atmospheric pressure
    Wang, Yanhui
    Zhang, Ruili
    Sun, Jizhong
    Zhang, Jianhong
    Wang, Qi
    Wang, Dezhen
    [J]. Gaodianya Jishu/High Voltage Engineering, 2016, 42 (02): : 405 - 413
  • [45] Optical spectroscopy investigation of N2-CH4 plasma jets simulating Titan atmospheric entry conditions
    Ndiaye, A. A.
    Lago, V.
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2011, 20 (01):
  • [46] Suppressing the formation of NOx and N2O in CO2/N2 dielectric barrier discharge plasma by adding CH4: scavenger chemistry at work
    Snoeckx, Ramses
    Van Wesenbeeck, Karen
    Lenaerts, Silvia
    Cha, Min Suk
    Bogaerts, Annemie
    [J]. SUSTAINABLE ENERGY & FUELS, 2019, 3 (06): : 1388 - 1395
  • [47] On the Measurement of N2(A3Σu+) Metastable in N2 Surface-Dielectric Barrier Discharge at Atmospheric Pressure
    P. F. Ambrico
    M. Šimek
    G. Dilecce
    S. De Benedictis
    [J]. Plasma Chemistry and Plasma Processing, 2008, 28 : 299 - 316
  • [48] N2 (A 3Σu+) behaviour in a N2-NO surface dielectric barrier discharge in the modulated ac regime at atmospheric pressure
    Simek, M.
    Ambrico, P. F.
    De Benedictis, S.
    Dilecce, G.
    Prukner, V.
    Schmidt, J.
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2010, 43 (12)
  • [49] On the measurement of N2(A3Σu+) metastable in N2 surface-dielectric barrier discharge at atmospheric pressure
    Ambrico, P. F.
    Simek, M.
    Dilecce, G.
    De Benedictis, S.
    [J]. PLASMA CHEMISTRY AND PLASMA PROCESSING, 2008, 28 (03) : 299 - 316
  • [50] Formation of Multi-pulse Glow Dielectric Barrier Discharge in Helium at Atmospheric Pressure
    Wang, Xiaolei
    Hao, Yanpeng
    Yang, Lin
    [J]. ICPADM 2009: PROCEEDINGS OF THE 9TH INTERNATIONAL CONFERENCE ON PROPERTIES AND APPLICATIONS OF DIELECTRIC MATERIALS, VOLS 1-3, 2009, : 610 - 613