Ultra-low threshold current vertical-cavity surface-emitting lasers for photonic integrated circuits

被引:0
|
作者
Deppe, DG
Huffaker, DL
Deng, HY
Deng, Q
Oh, TH
机构
关键词
semiconductor lasers; optical cavities; native-oxides; microcavities;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The use of selective oxidation to fabricate vertical-cavity surface-emitting lasers is described. The native-oxide impacts the device design in two ways, the first being in the introduction of an intracavity dielectric aperture that laterally confines the mode, and the second in the formation of high contrast dielectric Bragg reflectors to shorten the effective cavity length. To date the more important has been the index-confinement, with record low threshold currents, threshold voltages, and power conversion efficiencies being reported from several groups. However, future designs will likely also benefit from the reduced diffraction loss for a small mode size that is possible with high contrast native oxide/semiconductor mirrors. We describe some of the most important design issues in obtaining ultralow threshold operation.
引用
收藏
页码:664 / 674
页数:11
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