Reflective binary amplitude grating for soft x-ray shearing and Hartmann wavefront sensing

被引：2

作者：

Goldberg, Kenneth A. ^{[1
]}

Bryant, Diane ^{[1
]}

Wojdyla, Antoine ^{[1
]}

Helmbrecht, Michael ^{[2
]}

Gullikson, Eric ^{[3
]}

机构：

[1] Lawrence Berkeley Natl Lab, Adv Light Source, 1 Cyclotron Rd, Berkeley, CA 94720 USA

[2] AM Fitzgerald & Associates LLC, 700 Airport Blvd,Suite 210, Burlingame, CA 94010 USA

[3] Lawrence Berkeley Natl Lab, Ctr Xray Opt, 1 Cyclotron Rd, Berkeley, CA 94720 USA

来源：

OPTICS LETTERS | 2020年 / 45卷 / 17期

关键词：

Shearing;

D O I：

10.1364/OL.398737

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We demonstrate a reflective wavefront sensor grating suitable for the characterization of high-quality x-ray beamlines and optical systems with high power densities. Operating at glancing incidence angles, the optical element is deeply etched with a two-level pattern of shearing interferometry gratings and Hartmann wavefront sensor grids. Transverse features block unwanted light, enabling binary amplitude in reflection with high pattern contrast. We present surface characterization and soft x-ray reflectometry of a prototype grating array to demonstrate function prior to wavefront measurement applications. A simulation of device performance is shown. (C) 2020 Optical Society of America

引用

页码：4694 / 4697

页数：4

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