IC interconnect technology - Challenges and opportunities

被引:0
|
作者
Zhao, B [1 ]
机构
[1] Conexant Syst Inc, Newport Beach, CA 92660 USA
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暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reviews the status and challenges in interconnect technologies for integrated circuits (IC) applications, In order to meet the requirements in performance. power consumption, reliability, processing cost, and manufacturing yield, new materials and integration architectures must be introduced to IC interconnects while novel circuit architectures and new design schemes must be explored to mitigate the challenges and difficulties. The technological challenges in IC interconnects provide tremendous multidisciplinary and innovative research and development opportunities in architectures, processing, integration, materials, and characterization methodologies.
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页码:337 / 342
页数:6
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