Redeposition during ion-beam erosion can stabilize well-ordered nanostructures

被引：14
|
作者：
Diddens, C. [1 ]
Linz, S. J. [1 ]
机构：
[1] Univ Munster, Inst Theoret Phys, D-48149 Munster, Germany
来源：
EPL | 2013年 / 104卷 / 01期
关键词：
INSTABILITIES; MORPHOLOGY; SURFACES; GROWTH; DOTS;
D O I：
10.1209/0295-5075/104/17010
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Using a continuum formulation valid for arbitrary laterally two-dimensional surface profiles, we investigate the significance of redeposition of ion-beam eroded particles on spatio-temporally evolving surface morphologies of the target. Combining the effect of redeposition with standard roughening and smoothing effects of ion-beam erosion processes to a generalized nonlocal Kuramoto-Sivashinsky equation, we substantiate the decisive role of redeposition for the emergence of well-ordered ion-beam eroded hexagonally arranged dot structures as, e. g., experimentally observed on various semiconductor targets. Copyright (C) EPLA, 2013
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页数：6
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