Ultrathin MgB2 films fabricated by molecular beam epitaxy and rapid annealing

被引：17
|
作者：
Shibata, Hiroyuki [1 ,2 ]
Akazaki, Tatsushi [1 ]
Tokura, Yasuhiro [1 ]
机构：
[1] NTT Corp, NTT Basic Res Labs, Atsugi, Kanagawa 2430198, Japan
[2] NTT Corp, Nanophoton Ctr, Atsugi, Kanagawa 2430198, Japan
来源：
SUPERCONDUCTOR SCIENCE & TECHNOLOGY | 2013年 / 26卷 / 03期
关键词：
THIN-FILMS; SITU;
D O I：
10.1088/0953-2048/26/3/035005
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Ultrathin MgB2 films with thicknesses between 5 and 50 nm were fabricated using molecular-beam epitaxy and rapid annealing. The rapid annealing increases T-c and J(c) without degrading the surface flatness. A 10 nm-thick film shows T-c (0) = 24 K, J(c) (0) = 8 x 10(6) A cm(-2) with a root mean square roughness of 0.35 nm. Cross-sectional transmission electron microscopy and energy dispersion spectroscopy elemental analyses also revealed that the surfaces of the MgB2 films are oxidized to a thickness of 5 nm.
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页数：5
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