Control of band discontinuity at III-V semiconductor interface by Si intralayers

被引:4
|
作者
Ekpunobi, AJ [1 ]
机构
[1] Nnamdi Azikiwe Univ, Dept Phys & Ind Phys, Awka, Anambra State, Nigeria
关键词
band discontinuity; intralayers; induced potential;
D O I
10.1016/j.mseb.2003.09.041
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Control of valence band discontinuity at AlAs/GaAs interface by Si intralayers is studied using reformulated tight binding method. The hybrid energies are calculated in the sp(3)s* configuration. The valence band offset at the interface without intralayer is 0.46 eV, in good agreement with experiments. The tuning of valence band offset using intralayers yields a maximum at 0.5 ML with a value of 1.01 eV, corresponding to induced potential of 0.55 eV. The induced potential increases, reaches maximum and decreases between 0 and 2 ML. The physical significance is charging and discharging of the microscopic capacitor, having a corresponding maximum induced potential at the saturation doping. (C) 2003 Published by Elsevier B.V.
引用
收藏
页码:241 / 243
页数:3
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