Selective Growth of Vertically Aligned Carbon Nanotubes by Double Plasma Chemical Vapour Deposition Technique

被引：4

作者：

Cabral, Gil ^{[1
]}

Titus, Elby ^{[1
]}

Misra, D. S. ^{[2
]}

Gracio, J. ^{[1
]}

机构：

[1] Univ Aveiro, Dept Mech Engn, Ctr Mech Technol & Automat, NRD, P-3810193 Aveiro, Portugal

[2] Indian Inst Technol, Dept Phys, Bombay 400076, Maharashtra, India

来源：

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | 2008年 / 8卷 / 08期

关键词：

Carbon Nanotubes; Vertical Alignment; Chemical Vapour Deposition; Scanning Electron Microscopy; Raman Spectroscopy;

D O I：

10.1166/jnn.2008.AN05

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The selective growth of vertically aligned carbon nanotubes (VACNTs) on large area copper substrates was carried out using a double plasma hot-filament chemical vapour deposition system. Three independent power supplies were used to produce two glow discharges within the vacuum reactor. The generation of two glow discharges and the efficient utilization of the electric fields, by controlling the key process parameters, enabled the production of VACNTs. Morphology, density and structure of carbon nanotubes were characterized using Scanning Electron Microscopy and Raman Spectroscopy.

引用

页码：4029 / 4032

页数：4

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