Heat profiles of laser-irradiated nails

被引:6
|
作者
Paasch, Uwe [2 ,3 ]
Nenoff, Pietro [1 ]
Seitz, Anna-Theresa [2 ,3 ]
Wagner, Justinus A. [2 ,3 ]
Kendler, Michael [2 ,3 ]
Simon, Jan C. [2 ,3 ]
Grunewald, Sonja [2 ,3 ]
机构
[1] Partnerschaft Prof Pietro Nenoff & Dr Constanze K, Lab Med Mikrobiol, D-04579 Molbis, Germany
[2] Univ Klinikum Leipzig AoR, Klin & Poliklin Dermatol Venerol & Allergol, D-04103 Leipzig, Germany
[3] Univ Leipzig, Fak Med, D-04103 Leipzig, Germany
关键词
laser; fungi; thermography; temperature; nails; ONYCHOMYCOSIS; EFFICACY; DERMATOPHYTES; RESISTANCE;
D O I
10.1117/1.JBO.19.1.018001
中图分类号
Q5 [生物化学];
学科分类号
071010 ; 081704 ;
摘要
Onychomycosis is a worldwide problem with no tendency for self-healing, and existing systemic treatments achieve disease-free nails in only 35 to 76% of cases. Recently, treatment of nail fungus with a near-infrared laser has been introduced. It is assumed that fungal eradication is mediated by local heat. To investigate if laser treatment has the potential to eradicate fungal hyphae and arthrospores, laser heat application and propagation needs to be studied in detail. This study aimed to measure nail temperatures using real-time videothermography during laser irradiation. Treatment was performed using 808- and 980-nm linear scanning diode lasers developed for hair removal, enabling contact-free homogeneous irradiation of a human nail plate in one pass. Average and peak temperatures increased pass by pass, while the laser beam moved along the nail plates. The achieved mean peak temperatures (808 nm: 74.1 to 112.4 degrees C, 980 nm: 45.8 to 53.5 degrees C), as well as the elevation of average temperatures (808 nm: 29.5 to 38.2 degrees C, 980 nm: 27.1 to 32.6 degrees C) were associated with pain that was equivalent to that of hair removal procedures and was not significantly different for various wavelengths. The linear scanning laser devices provide the benefits of contact-free homogeneous heating of the human nail while ensuring adequate temperature rises. (C) 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
引用
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页数:8
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