Selective adsorption of metallocenes on clean and chemically modified Si(111) surfaces

被引：8
|
作者：
Lin, JL
Rauscher, H
Kirakosian, A
Himpsel, FJ
Dowben, PA
机构：
[1] Univ Wisconsin, Dept Phys, Madison, WI 53706 USA
[2] Univ Nebraska, Lincoln, NE USA
来源：
JOURNAL OF APPLIED PHYSICS | 1999年 / 86卷 / 10期
关键词：
D O I：
10.1063/1.371551
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Metallocene adsorption on clean Si(111) and CaF2/CaF1/Si(111) substrates has been investigated with scanning tunneling microscopy. The surface chemical composition is found to strongly change the adsorption site selectivity, leading to an enhanced edge selectivity on modified substrates. Templates with well-defined local chemical reactivity have been created via self-assembly. The selective adsorption of metallocenes on such tailored substrates facilitates patterning ordered arrays of magnetic nanowires and stripes on the single digit nanometer scale. (C) 1999 American Institute of Physics. [S0021-8979(99)01822-8].
引用
收藏
页码：5492 / 5496
页数：5
相关论文
共 50 条
  • [31] ADSORPTION OF WATER-VAPOR ON SI(111) SURFACES
    FUJIWARA, K
    NISHIJIMA, M
    PHYSICS LETTERS A, 1975, 55 (04) : 211 - 212
  • [32] Friction of chemically and topographically modified Si (100) surfaces
    Singh, R. Arvind
    Yoon, Eui-Sung
    WEAR, 2007, 263 : 912 - 919
  • [33] ADSORPTION OF NA ON (111)SI SURFACES IN AN AL-SI ALLOY
    LIU, QY
    LI, QC
    ZHANG, JR
    SCRIPTA METALLURGICA, 1988, 22 (06): : 789 - 791
  • [34] ARUPS OF WATER-ADSORPTION ON SI(100) AND SI(111) SURFACES
    FIVES, K
    MCGRATH, R
    STEPHENS, C
    MCGOVERN, IT
    CIMINO, R
    LAW, DSL
    JOHNSON, AL
    THORNTON, G
    JOURNAL OF PHYSICS-CONDENSED MATTER, 1989, 1 : SB105 - SB109
  • [35] INFRARED STUDY OF N-METHYLACETAMIDE ON CLEAN AND CHEMICALLY MODIFIED SURFACES
    TORNKVIST, C
    LIEDBERG, B
    LUNDSTROM, I
    LANGMUIR, 1991, 7 (03) : 479 - 485
  • [36] Interfacial chemistry of pentacene on clean and chemically modified silicon (001) surfaces
    Weidkamp, KP
    Hacker, CA
    Schwartz, MP
    Cao, XP
    Tromp, RM
    Hamers, RJ
    JOURNAL OF PHYSICAL CHEMISTRY B, 2003, 107 (40): : 11142 - 11148
  • [37] SURFACE STATES AT CLEAN SURFACES OF CLEAVED SI(111) AND GAAS(110)
    MEYER, F
    KROES, A
    SURFACE SCIENCE, 1975, 47 (01) : 124 - 131
  • [38] RELAXATION OF THE CLEAN AND H-COVERED C(111) AND THE CLEAN SI(111)-1X1 SURFACES
    STUMPF, R
    MARCUS, PM
    PHYSICAL REVIEW B, 1993, 47 (23): : 16016 - 16019
  • [39] CARBON-MONOXIDE ADSORPTION ON CLEAVED SI (111) AND GE (111) SURFACES
    VONWIENSKOWSKI, J
    PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1978, 88 (02): : K169 - K172
  • [40] Perturbation of Ge(111) and Si(111)√3α-Sn surfaces by adsorption of dopants
    Davila, Maria E.
    Avila, Jose
    Asensio, Maria Carmen
    Gothelid, Mats
    Karlsson, Ulf O.
    Le Lay, Guy
    SURFACE SCIENCE, 2006, 600 (16) : 3154 - 3159
12345