The Influence of Total and Oxygen Partial Pressures on Structure and Hydrophilic Property of TiO2 Thin Films Deposited by Reactive DC Magnetron Sputtering

被引：3
|
作者：
Chaiyakun, S. [1 ]
Buranawong, A. [1 ]
Deelert, T. [1 ]
Witit-anun, N. [1 ]
机构：
[1] Burapha Univ, Fac Sci, Dept Phys, Vacuum Technol & Thin Films Res Lab, Chon Buri 20131, Thailand
来源：
SMART MATERIALS | 2008年 / 55-57卷
关键词：
reactive magnetron sputtering; DC sputtering; titanium dioxide; hydrophilic;
D O I：
10.4028/www.scientific.net/AMR.55-57.465
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
TiO2 thin films have been deposited by reactive DC magnetron sputtering technique to study the effect of total pressure and oxygen partial pressure on structure and hydrophilic properties. The crystal structure and hydrophilic property was measured by XRD and contact angle meter, respectively. The results showed that the films were composed of pure rutile and mixed of anatase/rutile structure dependent on the total pressure and oxygen partial pressure. It was found that all films can perform hydrophilic property. In case of high total pressure, the films showed superhydrophilic property, whereas the films deposited under various oxygen partial pressures with fixed total pressure were all films exhibit superhydrophilic property.
引用
收藏
页码：465 / 468
页数：4
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