Effective electron mass and phonon modes in n-type hexagonal InN -: art. no. 115206

被引:178
|
作者
Kasic, A
Schubert, M
Saito, Y
Nanishi, Y
Wagner, G
机构
[1] Univ Leipzig, Fak Phys & Geowissensch, D-04103 Leipzig, Germany
[2] Univ Nebraska, Dept Elect Engn, Ctr Microelect & Opt Mat Res, Lincoln, NE 68588 USA
[3] Ritsumeikan Univ, Fac Sci & Engn, Shiga 5258577, Japan
[4] Inst Oberflachenmodifizierung Leipzig eV, D-04318 Leipzig, Germany
来源
PHYSICAL REVIEW B | 2002年 / 65卷 / 11期
关键词
D O I
10.1103/PhysRevB.65.115206
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Infrared spectroscopic ellipsometry and micro-Raman scattering are used to study vibrational and electronic properties of high-quality hexagonal InN. The 0.22-mum-thick highly n-conductive InN film was grown on c-plane sapphire by radio-frequency molecular-beam epitaxy. Combining our results from the ellipsometry data analysis with Hall-effect measurements, the isotropically averaged effective electron mass in InN is determined as 0.14m(0). The resonantly excited zone center E-1(TO) phonon mode is observed at 477 cm(-1) in the ellipsometry spectra. Despite the high electron concentration in the film, a strong Raman mode occurs in the spectral range of the unscreened A(1)(LO) phonon. Because an extended carrier-depleted region at the sample surface can be excluded from the ellipsometry-model analysis, we assign this mode to the lower branch of the large-wave-vector LO-phonon-plasmon coupled modes arising from nonconserving wave-vector scattering processes. The spectral position of this mode at 590 cm(-1) constitutes a lower limit for the unscreened A(1)(LO) phonon frequency.
引用
收藏
页码:1152061 / 1152067
页数:7
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