Ultra thin Tunnel Junction for Use in III-V Multijunction Solar Cells

被引:0
|
作者
Bauhuis, G. J. [1 ]
Mulder, P. [1 ]
Haverkamp, E. J. [1 ]
Schermer, J. J. [1 ]
机构
[1] Radboud Univ Nijmegen, Inst Mol & Mat, NL-6524 AJ Nijmegen, Netherlands
关键词
III-V semiconductor materials; tunneling; photovoltaic cells; gallium arsenide;
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
In the ideal case, a III-V tunneljunction (TJ) used in a concentrator setup can handle high current, has a low resistance and does not absorb photons with an energy higher than the subcell(s) below it. In practice, TJs for concentrator systems are made of GaAs or AlGaAs with a low Al fraction, so absorption is present and causes an efficiency loss. Simulations show that in a standard 40 nm thick GaAs TJ the current density loss due to absorption is 1.7 mA/cm(2). This value can be reduced by replacing one of the GaAs layers by AlGaAs and/or using a thinner TJ. We have tested Al0.1GaAs/GaAs TJs with a total thickness of 17.5 nm. Two n-type dopants were investigated: Te and Si. For the p-type layer C was used. Excellent TJs with peak current densities above 600 A/cm(2) and a series resistance of 0.5 m Omega cm(2) were obtained. In this ultra thin TJ current density losses were reduced to 0.6 mA/cm(2).
引用
收藏
页码:909 / 912
页数:4
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