Conformational rearrangements in interfacial region of polydimethylsiloxane melt films

被引：19

作者：

Evmenenko, G ^{[1
]}

Mo, HD ^{[1
]}

Kewalramani, S ^{[1
]}

Dutta, P ^{[1
]}

机构：

[1] Northwestern Univ, Dept Phys & Astron, Evanston, IL 60208 USA

来源：

POLYMER | 2006年 / 47卷 / 03期

基金：

美国国家科学基金会;

关键词：

X-ray specular reflectivity; PDMS films; immobilized layer;

D O I：

10.1016/j.polymer.2005.12.010

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Synchrotron X-ray reflectivity (XRR) confirms the formation of a quasi-immobilized layer in thin films of polydimethylsiloxane (PDMS) melts near silica surfaces. This layer (40-60 angstrom) has a lower density than the bulk value, and its thickness varies slightly with PDMS molecular weight. Formation of this layer is very rapid for PDMS melts with low molecular weights (below entanglement limit for these molecules) but takes 5-10 h for higher molecular weights (close to and above their entanglement value). (c) 2005 Elsevier Ltd. All rights reserved.

引用

页码：878 / 882

页数：5

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