Molecular beam epitaxy of periodic BaF2/PbEuSe layers on Si(111)

被引:4
|
作者
Fang, XM [1 ]
Wu, HZ
Shi, Z
McCann, PJ
Dai, N
机构
[1] Univ Oklahoma, Sch Elect & Comp Engn, Norman, OK 73019 USA
[2] Univ Oklahoma, Lab Elect Properties Mat, Norman, OK 73019 USA
[3] Univ Oklahoma, Dept Phys & Astron, Norman, OK 73019 USA
来源
关键词
D O I
10.1116/1.590744
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Bragg reflector structures consisting of BaF2/PbEuSe stacks have been epitaxially grown on CaF2/Si (111) substrates, The reflectors are centered at a wavelength of 4.0 mu m with a bandwidth of about 3.0 mu m. Reflectivity as high as 95% at the center wavelength has been achieved in three-stack reflectors. Cracks were visible under an optical Normarski microscope in two-stack reflectors, The formation of cracks is probably due to the accumulation of the residual thermal strain in thick layers or the hindrance of dislocation glide at the BaF2/PbEuSe interfaces. (C) 1999 American Vacuum Society. [S0734-211X(99)06203-4].
引用
收藏
页码:1297 / 1300
页数:4
相关论文
共 50 条
  • [31] MOLECULAR-BEAM EPITAXY OF CRSI2 ON SI(111)
    FATHAUER, RW
    GRUNTHANER, PJ
    LIN, TL
    CHANG, KT
    MAZUR, JH
    JAMIESON, DN
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (02): : 708 - 712
  • [32] ELECTRON INTERACTION WITH (111)BAF2
    KNYAZEV, SA
    AZOV, KK
    KORSUKOV, VE
    NAZAROV, RR
    FIZIKA TVERDOGO TELA, 1989, 31 (09): : 269 - 271
  • [33] Molecular beam epitaxial growth of Eu-doped CaF2 and BaF2 on Si
    Fang, XM
    Chatterjee, T
    McCann, PJ
    Liu, WK
    Santos, MB
    Shan, W
    Song, JJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (03): : 2267 - 2270
  • [35] CdTe(111)B grown on Si(111) by molecular beam epitaxy
    Rujirawat, S
    Xin, Y
    Browning, ND
    Sivananthan, S
    Smith, DJ
    Tsen, SCY
    Chen, YP
    Nathan, V
    APPLIED PHYSICS LETTERS, 1999, 74 (16) : 2346 - 2348
  • [36] Growth of GaN Layers on Si(111) Substrates by Plasma-Assisted Molecular Beam Epitaxy
    S. N. Timoshnev
    A. M. Mizerov
    M. S. Sobolev
    E. V. Nikitina
    Semiconductors, 2018, 52 : 660 - 663
  • [37] Nonisomorphic ErF3 layers on Si(111) substrates grown by molecular beam epitaxy
    Ko, JM
    Durbin, SD
    Fukuda, T
    Inaba, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (03): : 922 - 926
  • [38] Raman Spectroscopy of GaN Epitaxial Layers Synthesized on Si(111) by Molecular Beam Epitaxy with Nitridation
    E. A. Lubyankina
    V. V. Toporov
    A. M. Mizerov
    S. N. Timoshnev
    K. Yu. Shubina
    B. H. Bairamov
    A. D. Bouravleuv
    Semiconductors, 2020, 54 : 1847 - 1849
  • [39] VALENCE BAND OFFSET IN ZNS LAYERS ON SI(111) GROWN BY MOLECULAR-BEAM EPITAXY
    MAIERHOFER, C
    KULKARNI, S
    ALONSO, M
    REICH, T
    HORN, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (04): : 2238 - 2243
  • [40] Molecular beam epitaxial growth of IV-VI multiple quantum well structures on Si(111) and BaF2(111) and optical studies of epilayer heating
    Wu, HZ
    McCann, PJ
    Alkhouli, O
    Fang, XM
    McAlister, D
    Namjou, K
    Dai, N
    Chung, SJ
    Rappl, PHO
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (04): : 1447 - 1454