Rheology of sub-nanometer thick water films

被引：0
|
作者：
Li, Tai-de [1 ]
Szoszkiewicz, Robert [1 ]
Riedo, Elisa [1 ]
机构：
[1] Georgia Inst Technol, Sch Phys, Atlanta, GA 30332 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2006年 / 231卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
498-COLL
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页数：2
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