Femtosecond Laser Direct Writing of Antireflection Microstructures on the Front and Back Sides of a GaSe Crystal

The development of antireflection coatings is crucially important to improve the performance of various photonic devices, for example, to increase the efficiency of harmonic generators based on high-refractive index crystals with significant Fresnel losses. A promising technique for the reducing of radiation reflection is to change the refractive index by fabrication of antireflection microstructures (ARM) on the surface. This paper presents the results of ARM direct writing on the surfaces of a nonlinear GaSe crystal (of epsilon modification, according to Raman and photoluminescence spectroscopy data) using fs laser radiation and a multiples approach. An increase in transmission from 65% to 80% for an ARM fabricated on one side of the crystal and up to 94% for ARMs fabricated on both sides is demonstrated. The increase in transmission with the increasing pulse energy, as well as with an increase in the number of pulses used for the formation of a single crater, is shown. The experimental results of ARM transmission of GaSe are in qualitative agreement with the simulation results based on the measured profiles and morphology of the ARM structures.