Insights into the off-state breakdown mechanisms in power GaN HEMTs

被引:16
|
作者
Zagni, N. [1 ]
Puglisi, F. M. [1 ]
Pavan, P. [1 ]
Chini, A. [1 ]
Verzellesi, G. [2 ,3 ]
机构
[1] Univ Modena & Reggio Emilia, DIEF, Modena, Italy
[2] Univ Modena & Reggio Emilia, DISMI, Reggio Emilia, Italy
[3] Univ Modena & Reggio Emilia, EN&TECH, Reggio Emilia, Italy
关键词
Buffer layers - III-V semiconductors - Gallium nitride - Aluminum gallium nitride - Electron injection;
D O I
10.1016/j.microrel.2019.06.066
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We analyze the off-state, three-terminal, lateral breakdown in AlGaN/GaN HEMTs for power switching applications by comparing two-dimensional numerical device simulations with experimental data from device structures with different gate-to-drain spacing and with either undoped or Carbon-doped GaN buffer layer. Our simulations reproduce the different breakdown-voltage dependence on the gate-drain-spacing exhibited by the two types of device and attribute the breakdown to: i) a combination of gate electron injection and source-drain punch-through in the undoped HEMTs; and ii) avalanche generation triggered by gate electron injection in the C-doped HEMTs.
引用
收藏
页数:5
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