Viscosity of CHF3 in the Critical Region

被引:0
|
作者
Yokoyama, C. [1 ]
Takahashi, M. [1 ]
机构
[1] Tohoku Univ, Inst Chem React Sci, 2-1-1 Katahira, Aoba-ku, Sendai 98077, Japan
关键词
critical anomaly; mode-coupling theory; trifluoromethane; viscosity;
D O I
暂无
中图分类号
O414.1 [热力学];
学科分类号
摘要
The gaseous visosity of trifluoromethane (CHF3) was measured in the critical region. The experimental temperature range was between 299.150 and 303.150 K and the pressure range was up to 5.66 MPa. The measurements were obtained with an oscillating-disk viscometer, combined with local determination of the density at the position of the oscillating disk, and they have an estimated accuracy of 0.6% for the viscosity and 0.5% for the gas density. The viscosity of CHF3 exhibits an anomalous increase near the critical point. The anomalous increase in viscosity was analyzed with the viscosity equation proposed by Basu and Sengers.
引用
收藏
页码:1369 / 1385
页数:17
相关论文
共 50 条
  • [41] ABINITIO MOLECULAR-ORBITAL STUDY OF DIMER CHF3
    POPOWICZ, A
    ISHIDA, T
    CHEMICAL PHYSICS LETTERS, 1981, 83 (03) : 520 - 525
  • [42] ABSOLUTE IR INTENSITY MEASUREMENTS OF FLUOROFORM (CHF3) FUNDAMENTALS
    LEVINE, RA
    PERSON, WB
    JOURNAL OF PHYSICAL CHEMISTRY, 1977, 81 (11): : 1118 - 1119
  • [43] An experimental and kinetic modeling study of the reaction of CHF3 with methane
    Yu, Hai
    Kennedy, Eric M.
    Mackie, John C.
    Dlugogorski, Bogdan Z.
    ENVIRONMENTAL SCIENCE & TECHNOLOGY, 2006, 40 (18) : 5778 - 5785
  • [44] Electron drift and attachment in CHF3 and its mixtures with argon
    Wang, YC
    Christophorou, LG
    Olthoff, JK
    Verbrugge, JK
    CHEMICAL PHYSICS LETTERS, 1999, 304 (5-6) : 303 - 308
  • [45] Measured cross sections and ion energies for a CHF3 discharge
    Peko, BL
    Champion, RL
    Rao, MVVS
    Olthoff, JK
    JOURNAL OF APPLIED PHYSICS, 2002, 92 (03) : 1657 - 1662
  • [46] Pollutant emissions management in an existing plant:: The CHF3 case
    Pantzali, MN
    Mouza, AA
    Paras, SV
    CHEMICAL ENGINEERING & TECHNOLOGY, 2005, 28 (02) : 187 - 192
  • [47] A kinetic study on the reaction of CHF3 with H at high temperatures
    Takahashi, K
    Yamamori, Y
    Inomata, T
    JOURNAL OF PHYSICAL CHEMISTRY A, 1997, 101 (48): : 9105 - 9110
  • [48] NUCLEAR MAGNETIC RELAXATION AND OVERHAUSER EFFECTS IN LIQUID CHF3
    CHAFFIN, JH
    HUBBARD, PS
    JOURNAL OF CHEMICAL PHYSICS, 1967, 46 (04): : 1511 - &
  • [49] RESIDUE FORMATION ON SI SURFACES IN A CHF3 DISCHARGE ENVIRONMENT
    VITKAVAGE, DJ
    MAYER, TM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (06): : 1283 - 1291
  • [50] Reaction mechanisms in both a CHF3/O2/Ar and CHF3/H2/Ar radio frequency plasma environment
    Wang, Ya-Fen
    Lee, Wen-Jhy
    Chen, Chuh-Yung
    Hsieh, Lien-Te
    Industrial and Engineering Chemistry Research, 1999, 38 (09): : 3199 - 3210