In-Plane Ferrielectric Order in van der Waals β′-In2Se3

被引:2
|
作者
Wang, Lin [1 ,2 ]
Zhou, Xin [1 ]
Su, Mengyao [3 ]
Zhang, Yishu [1 ]
Li, Runlai [1 ]
Zhang, Rongrong [1 ]
Wu, Xiao [1 ]
Wu, Zhenyue [1 ]
Wong, Walter [1 ]
Xu, Qing-hua [1 ]
He, Qian [3 ]
Loh, Kian Ping [1 ]
机构
[1] Natl Univ Singapore, Dept Chem, Singapore 117543, Singapore
[2] Shanghai Jiao Tong Univ, Sch Mech Engn, Shanghai 200240, Peoples R China
[3] Natl Univ Singapore, Dept Mat Sci & Engn, Singapore 117574, Singapore
基金
新加坡国家研究基金会; 中国国家自然科学基金;
关键词
van der Waals materials; In2Se3; ferroelectric materials; ferrielectricity; antiferroelectricity; FERROELECTRICITY; IN2SE3;
D O I
10.1021/acsnano.3c09250
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
van der Waals ferroic materials exhibit rich potential for implementing future generation functional devices. Among these, layered beta'-In2Se3 has fascinated researchers with its complex superlattice and domain structures. As opposed to ferroelectric alpha-In2Se3, the understanding of beta'-In2Se3 ferroic properties remains unclear because ferroelectric, antiferroelectric, and ferroelastic characteristics have been separately reported in this material. To develop useful applications, it is necessary to understand the microscopic structural properties and their correlation with macroscopic device characteristics. Herein, using scanning transmission electron microscopy (STEM), we observed that the arrangement of dipoles deviates from the ideal double antiparallel antiferroelectric character due to competition between antiferroelectric and ferroelectric structural ordering. By virtue of second-harmonic generation, four-dimensional STEM, and in-plane piezoresponse force microscopy, the long-range inversion-breaking symmetry, uncompensated local polarization, and net polarization domains are unambiguously verified, revealing beta'-In2Se3 as an in-plane ferrielectric layered material. Additionally, our device study reveals analogous resistive switching behaviors of different types owing to polarization switching, defect migration, and defect-induced charge trapping/detrapping processes.
引用
收藏
页码:809 / 818
页数:10
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