Tight-binding analysis of the effect of strain on the band structure of GaN

被引:2
|
作者
Miyazaki, Wataru [1 ]
Tanaka, Hajime [1 ]
Mori, Nobuya [1 ]
机构
[1] Osaka Univ, Grad Sch Engn, Suita, Osaka 5650871, Japan
关键词
gallium nitride; strain; breakdown; MOBILITY ENHANCEMENT; SEMICONDUCTORS; PARAMETERS;
D O I
10.35848/1347-4065/acb7fe
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effects of strain on the band structure of GaN are investigated by using an empirical tight-binding method. The impacts on its bandgap, carrier effective mass, and group velocity are discussed. By analyzing the orbital components at the top of the valence band, the cause of the variation of the band structure including effective-mass exchange is discussed. Analysis of the average group velocity indicates that tensile uniaxial or compressive biaxial strain may be beneficial for achieving higher breakdown voltage in vertical GaN devices due to the smaller group velocity of the valence band. For the same reason, we also predict higher breakdown voltages due to tensile biaxial strain for horizontal devices.
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页数:9
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