First-principles investigation on the effects of alloying elements on Cu/Mo interface

被引:2
|
作者
Li, Zhenzhou [1 ]
Ding, Pengzhan [1 ]
Wang, Rongyang [1 ]
Wang, Chengduo [1 ,2 ]
Li, Qingkui [1 ,2 ]
Sun, Benshuang [1 ,2 ]
Zhang, Yan [3 ,4 ]
机构
[1] Zhengzhou Univ, Sch Mat Sci & Engn, 100 Sci Ave, Zhengzhou 450001, Henan, Peoples R China
[2] Zhongyuan Crit Met Lab, 100 Sci Ave, Zhengzhou 450001, Henan, Peoples R China
[3] Nanjing Inst Technol, Sch Mat Sci & Engn, Nanjing 211167, Jiangsu, Peoples R China
[4] Key Lab Adv Struct Mat & Applicat Technol Jiangsu, Nanjing 211167, Jiangsu, Peoples R China
关键词
First principles; Adhesion; Interfaces; Electronic structure; Alloying elements; NANOINDENTATION; MO;
D O I
10.1016/j.cplett.2023.140895
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The influence of some alloying elements on the adhesion work and electron structure of the Cu/Mo interface was investigated by first-principles calculation. The results show that the work of Cu/Mo interface adhesion can be improved as some elements are introduced, such as W, Cr, and Nb. However, some other elements are unfavorable to the interface adhesion work, such as Y and Ni. The overlap region of states is large and the overlap peaks are strong between W-d and Cu-d compared with those between Mo-d and Cu-d. The reverse is true for the overlap states between Y-d and Cu-d.
引用
收藏
页数:4
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