Absolute alignment measurement of underlayer and overlayer of diffraction-based overlay mark by image-based alignment metrology system

被引：0

作者：

Lee, Jaeil ^{[1
]}

Park, Iksun ^{[1
]}

Park, Youngjin ^{[1
]}

Hwang, Jonghyun ^{[1
]}

Ha, Hyeonjun ^{[1
]}

Sohn, Jaewoong ^{[1
]}

Lee, Jaehee ^{[2
]}

Moon, Jinseok ^{[2
]}

Kondo, Yuki ^{[3
]}

Ando, Satoshi ^{[3
]}

机构：

[1] Samsung Elect Co Ltd, Suwon, South Korea

[2] Nikon Precis Korea Co Ltd, Bountiful, UT USA

[3] Nikon Inc, Tokyo, Japan

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII | 2023年 / 12496卷

关键词：

Overlay; Optical alignment; Distortion correction; Process control; Absolute position measurement; Diffraction-Based Overlay;

D O I：

10.1117/12.2657656

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

An absolute alignment measurement of an underlayer and overlayer of overlay mark enables an innovative overlay control by which each layer's grid errors can be independently corrected, versus of a conventional relative overlay measurement and control. We demonstrate an absolute alignment measurement of stacked overlay marks such as Diffraction-Based Overlay (DBO) by adopting a unique method incorporated in a standalone, image-based alignment metrology system. An alignment accuracy of each layer is evaluated using product wafers by comparing alignment measurement result to the reference data. In conclusion, we were able to achieve R-2>0.97 coefficient.

引用

页数：5

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