Dynamics of sputtered particles in multipulse HiPIMS discharge

被引：3
|
作者：
Hnilica, J. [1 ]
Klein, P. [1 ]
Vasina, P. [1 ]
Snyders, R. [2 ,3 ]
Britun, N. [2 ,4 ]
机构：
[1] Masaryk Univ, Dept Phys Elect, Kotlarska 2, CZ-61137 Brno, Czech Republic
[2] Univ Mons, Chim Interact Plasma Surface ChIPS, CIRMAP, 23 Pl Parc, B-7000 Mons, Belgium
[3] Mat Nova Res Ctr, Parc Initialis, B-7000 Mons, Belgium
[4] Nagoya Univ, Ctr Low Temp Plasma Sci, Chikusa Ku, Nagoya 4648603, Japan
来源：
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2023年 / 32卷 / 04期
关键词：
sputtering; multipulse; HiPIMS; discharge; LIF; AAS; THIN-FILMS; DEPOSITION RATE; PULSED DC; POWER; COATINGS; PLASMA; ENHANCEMENT; TRANSPORT;
D O I：
10.1088/1361-6595/acc686
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
The behavior of the ground state neutral and singly ionized atoms is studied in multipulse high power impulse magnetron sputtering processes. The time-resolved two-dimensional laser induced fluorescence was used for imaging the discharge volume (density mapping) during the plasma-on and plasma-off time phases. The role of the number of micropulses and delay time between the micropulses in the pulse package is analyzed and discussed systematically. In addition, the propagation of the sputtered particles from the target is investigated.
引用
收藏
页数：12
相关论文
共 50 条
  • [41] Energy Dispersion of Sputtered Particles
    Moos, Evgeny N.
    Savushkin, Oleg V.
    2014 TENTH INTERNATIONAL VACUUM ELECTRON SOURCES CONFERENCE (IVESC), 2014,
  • [42] Surface motion of sputtered particles
    Roulston, KI
    PROCEEDINGS OF THE CAMBRIDGE PHILOSOPHICAL SOCIETY, 1941, 37 : 440 - 442
  • [43] ON THE AVERAGE ENERGY OF SPUTTERED PARTICLES
    FALCONE, G
    NUOVO CIMENTO DELLA SOCIETA ITALIANA DI FISICA D-CONDENSED MATTER ATOMIC MOLECULAR AND CHEMICAL PHYSICS FLUIDS PLASMAS BIOPHYSICS, 1987, 9 (07): : 893 - 900
  • [44] ON EXCITED STATE OF SPUTTERED PARTICLES
    VANDERWE.WF
    ROL, PK
    NUCLEAR INSTRUMENTS & METHODS, 1965, 38 (DEC): : 274 - &
  • [45] EFFECTS OF HELIUM ADDITION TO AN ARGON GLOW-DISCHARGE PLASMA ON EMISSION-LINES OF SPUTTERED PARTICLES
    WAGATSUMA, K
    HIROKAWA, K
    ANALYTICAL CHEMISTRY, 1988, 60 (07) : 702 - 705
  • [46] Measurement of sputtered Mg particles in a plasma display panel discharge using laser induced fluorescence technique
    Sung, YM
    Otsubo, M
    Honda, C
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2006, 34 (02) : 331 - 335
  • [47] One-Step DcMS and HiPIMS Sputtered CIGS Films from a Quaternary Target
    Oubaki, Rachid
    Machkih, Karima
    Larhlimi, Hicham
    Abegunde, Olayinka O.
    Alami, Jones
    Makha, Mohammed
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2023, 220 (21):
  • [48] Multi-instrument characterization of HiPIMS and DC magnetron sputtered tungsten and copper films
    Roychowdhury, Tuhin
    Shah, Dhruv
    Jain, Varun
    Patel, Dhananjay I.
    Dodson, Berg
    Skinner, William
    Hilfiker, James N.
    Smith, Stacey J.
    Linford, Matthew R.
    SURFACE AND INTERFACE ANALYSIS, 2020, 52 (07) : 433 - 441
  • [49] The influence of superimposed DC current on electrical and spectroscopic characteristics of HiPIMS discharge
    Zuo, Xiao
    Chen, Rende
    Liu, Jingzhou
    Ke, Peiling
    Wang, Aiying
    AIP ADVANCES, 2018, 8 (01):
  • [50] Insights into the copper HiPIMS discharge: deposition rate and ionised flux fraction
    Fischer, J.
    Renner, M.
    Gudmundsson, J. T.
    Rudolph, M.
    Hajihoseini, H.
    Brenning, N.
    Lundin, D.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2023, 32 (12):
12345