Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching

被引：13
|
作者：
Lim, Chaehun [1 ]
Ha, Seongmin [1 ]
Ha, Naeun [1 ]
Jeong, Seo Gyeong [1 ]
Lee, Young-Seak [1 ,2 ]
机构：
[1] Chungnam Natl Univ, Dept Chem Engn & Appl Chem, Daejeon 34134, South Korea
[2] Chungnam Natl Univ, Inst Carbon Fus Technol InCFT, Daejeon 34134, South Korea
来源：
CARBON LETTERS | 2024年 / 34卷 / 02期
关键词：
Lithium-ion primary battery; CFX; Plasma; Surface treatment; FLUORINATED GRAPHENE; CARBON NANOTUBES; DENSITY; BATTERY;
D O I：
10.1007/s42823-023-00597-x
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The effects of different plasma agent species (CF4, N-2) over the conductivity of CFX cathode material were identified. Both plasma treatments have surface etching effect, while the CF4 plasma treatment has C-F bond modification effect and the N-2 plasma treatment has defluorination effect. The changes of surface chemical species and porosity along the plasma agent were elucidated. Moreover, the electrochemical properties of plasma-treated CFX confirmed the effects of plasma treatments. The charge-transfer resistance of plasma-treated CFX was maximum 60.3% reduced than the pristine CFX. The effects of surface chemical modification coupled with etching along the plasma gas agents were compared and identified with their reaction mechanisms.
引用
收藏
页码：611 / 617
页数：7
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