Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching

被引：13

作者：

Lim, Chaehun ^{[1
]}

Ha, Seongmin ^{[1
]}

Ha, Naeun ^{[1
]}

Jeong, Seo Gyeong ^{[1
]}

Lee, Young-Seak ^{[1
,2
]}

机构：

[1] Chungnam Natl Univ, Dept Chem Engn & Appl Chem, Daejeon 34134, South Korea

[2] Chungnam Natl Univ, Inst Carbon Fus Technol InCFT, Daejeon 34134, South Korea

来源：

CARBON LETTERS | 2024年 / 34卷 / 02期

关键词：

Lithium-ion primary battery; CFX; Plasma; Surface treatment; FLUORINATED GRAPHENE; CARBON NANOTUBES; DENSITY; BATTERY;

D O I：

10.1007/s42823-023-00597-x

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The effects of different plasma agent species (CF4, N-2) over the conductivity of CFX cathode material were identified. Both plasma treatments have surface etching effect, while the CF4 plasma treatment has C-F bond modification effect and the N-2 plasma treatment has defluorination effect. The changes of surface chemical species and porosity along the plasma agent were elucidated. Moreover, the electrochemical properties of plasma-treated CFX confirmed the effects of plasma treatments. The charge-transfer resistance of plasma-treated CFX was maximum 60.3% reduced than the pristine CFX. The effects of surface chemical modification coupled with etching along the plasma gas agents were compared and identified with their reaction mechanisms.

引用

页码：611 / 617

页数：7

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