Humidity- tunable liquefaction of Cr thin-film and its application to patterning

被引:4
|
作者
Ghosh, Swapnendu Narayan [1 ]
Talukder, Santanu [1 ]
机构
[1] Indian Inst Sci Educ & Res Bhopal, Dept Elect Engn & Comp Sci, Bhopal, India
关键词
oxidation; electrochemistry; lithography; water; NANO-OXIDATION; CONDUCTIVITY; KINETICS;
D O I
10.1088/1361-6528/aca547
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Electric field induced liquefaction of chromium (Cr) thin-films, being a surface-based process, is affected by the moisture content in the surroundings. The said process is an electrochemical reaction, which takes place on an electrically stressed Cr thin-film. The reaction results in a liquid region, which appears to flow out radially from the tip of the cathode. A proper understanding of the phenomenon is warranted as it is applied for performing a nanolithography process, electrolithography (ELG). In this study we have focused on the effect of relative humidity (RH) on the material formation and transport on electrically stressed Cr thin-film. Varying the RH over a wide range, the phenomenon is studied using different levels of DC stress. The effect of the applied DC stress coupled with varying levels of RH showed trends which are explained qualitatively and quantitatively. The results indicate that RH could be a pivotal parameter affecting the above-mentioned phenomenon on electrically stressed Cr thin-films and could significantly alter the minimum feature size attainable by ELG. To demonstrate the effect of RH on ELG, lines are drawn at various humidity levels resulting in greater than 100% increase in the attainable line width when RH is increased by about 40%.
引用
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页数:8
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