Spectral analysis of radiation-induced luminescence of a ceramic thick-film substrate

被引：0
|
作者：
Mandowska, Ewa [1 ]
Majgier, Renata [2 ]
Grzesiak, Wojciech [3 ,4 ]
Mandowski, Arkadiusz [2 ]
机构：
[1] Uniwersytet Jana Dlugosza Czestochowie, Katedra Zaawansowanych Metod Obliczeniowych, Ul Armii Krajowej 13-15, PL-42200 Czestochowa, Poland
[2] Uniwersytet Jana Dlugosza Czestochowie, Katedra Fizyki Doswiadczalnej & Stosowanej, Ul Armii Krajowej 13-15, PL-42200 Czestochowa, Poland
[3] Siec Badawcza Lukasiewicz Inst Mikroelekt & Foton, Ctr Mikroelekt Hybrydowej, Ul Zablocie 39, PL-30701 Krakow, Poland
[4] LTCC, Ul Zablocie 39, PL-30701 Krakow, Poland
来源：
PRZEGLAD ELEKTROTECHNICZNY | 2023年 / 99卷 / 11期
关键词：
thick film technology; dosimetry; optically stimulated luminescence (OSL); spectrally resolved thermoluminescence (SR-TL); MOBILE PHONES; OSL; DOSIMETRY; THERMOLUMINESCENCE;
D O I：
10.15199/48.2023.11.36
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Many popular electronic devices are made using a thick film substrate. This element is usually made of aluminum oxide (Al2O3) with various dopants. This material exhibits optically stimulated luminescence (OSL) when exposed to ionizing radiation. This makes it possible to use such elements in retrospective and emergency dosimetry. Spectrally resolved thermoluminescence (SR-TL) measurements showed that the emission mainly occurs in the red and near-infrared regions.
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页码：204 / 207
页数：4
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