Microstructure and Properties of Thin Films of Zirconium Produced by High-Frequency Laser Deposition

被引：0
|
作者：
Bosak, N. A. [1 ]
Chumakov, A. N. [1 ]
Baran, L. V. [2 ]
Malyutina-Bronskaya, V. V. [3 ]
Ivkovich, M. [4 ]
Sakan, N. [4 ]
Ivanov, A. A. [1 ]
机构：
[1] Natl Acad Sci Belarus, Inst Phys, Minsk, BELARUS
[2] Belarus State Technol Univ, Minsk, BELARUS
[3] Natl Acad Sci, GNPO Opt Optoelect & Laser Technol, Minsk, BELARUS
[4] Inst Phys, Belgrade, Serbia
来源：
JOURNAL OF APPLIED SPECTROSCOPY | 2024年 / 90卷 / 06期
关键词：
high-frequency laser action; thin film structure; transmission and reflection spectra; electrophysical characteristics;
D O I：
10.1007/s10812-024-01659-2
中图分类号：
O433 [光谱学];
学科分类号：
0703 ; 070302 ;
摘要：
Nanostructured thin films on a silicon substrate were obtained by high-frequency periodic pulse f similar to 6-10 kHz action of laser radiation with wavelength lambda = 1.064 mu m and power density q = 120 MW/cm(2) on zirconium in a vacuum chamber at pressure p = 2.2 Pa. The morphology of the thin films of zirconium was studied by atomic-force microscopy. The transmission spectra of the zirconium films in the visible and near and mid IR regions were obtained. The electrophysical characteristics of the Zr/Si structures were analyzed.
引用
收藏
页码：1236 / 1240
页数：5
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